| DATE: | 6/9/2009 | RECIPE: | DOX900C.005 | Operator | Burris | ||||
| TUBE: | Tystar T5 | ||||||||
| Process: | 10 nm gate oxide | ||||||||
| TEMPL: | 900 | Oxidation | 19.33 | min | |||||
| TEMPC: | 900 | GAS | O2 | ||||||
| TEMPS: | 900 | FLOW | 3 l/min | ||||||
| WAFER: | P-Type 10 Ohm/cm | ||||||||
| SIZE | 100mm | Substrate: | <100> | ||||||
| LOAD | 5 | Comment | Ellipsometer = 103.4 A center | ||||||
| POSITION | CENTER | TOP | LEFT | FLAT | RIGHT | Mean Avg | S1 Dev | + or - % | HI-LO% |
| 13 | 103.4 | 103.1 | 108.5 | 104.4 | 103.1 | 104.5 | 2.30 | 2.20 | 2.58 |