| DATE: | 6/9/2008 | RECIPE: | DOX10nm.005 | Operator | Gordon | ||||
| TUBE: | Tystar T5 | ||||||||
| Process: | 10 nm gate oxide | ||||||||
| TEMPL: | 900 | Oxidation | 19.33 | min | |||||
| TEMPC: | 900 | GAS | O2 | ||||||
| TEMPS: | 900 | FLOW | 3 l/min | ||||||
| WAFER: | P-Type 10 Ohm/cm | ||||||||
| SIZE | 100mm | Substrate: | <100> | ||||||
| LOAD | 5 | Comment | Ellipsometer | ||||||
| POSITION | CENTER | TOP | LEFT | FLAT | RIGHT | Mean Avg | S1 Dev | + or - % | HI-LO% |
| 13 | 100.9 | 101.4 | 100.4 | 100.5 | 102 | 101.0 | 0.67 | 0.66 | 0.79 |