DATE:	12/4/2007		RECIPE:	LTO.004		Operator	Gordon
TUBE #:	T4		FILE:
Process:	Low Temperature Oxide
TEMPL:	450	DEP TIME	30	min
TEMPC:	450	GAS	SiH4	GAS	O2	PRCPR	250 mtorr
TEMPS:	450	FLOW	85	FLOW	120
WAFER:	4" SILICON
SIZE	100mm	Substrate:	100
LOAD	11	Comment:	Refractive index = 1.44, new 4" caged boat from tystar
POSITION	1CENTER	2TOP	3BOTTOM	4RIGHT	5LEFT	Mean Avg	S1 Dev	+ or - %	HI-LO%
3	4742	4921	4396	4644	4432	4627.0	218.71	4.73	5.67
7	5032	4884	4683	5102	4725	4885.2	183.78	3.76	4.29
11	5074	5355	4659	5125	4705	4983.6	295.42	5.93	6.98
				Wafer to	Wafer	4831.9	269.22	5.57	9.92
						Dep Rate:	161.06	A/min