DATE:	9/12/2005		RECIPE:	LTO.004		Operator	Gordon
TUBE #:	T4		FILE:
Process:	Low Temperature Oxide
TEMPL:	450	DEP TIME	120	min
TEMPC:	450	GAS	SiH4	GAS	O2	PRCPR	250 mtorr
TEMPS:	450	FLOW	85	FLOW	120
WAFER:	4" SILICON
SIZE	100mm	Substrate:	100
LOAD	11	Comment:	Refractive index = 1.44, new 4" caged boat from tystar
POSITION	1CENTER	2TOP	3BOTTOM	4RIGHT	5LEFT	Mean Avg	S1 Dev	+ or - %	HI-LO%
4	42783	44015	44015	40165	39699	42135.4	2079.89	4.94	5.12
9	40622	42177	41035	38416	37527	39955.4	1924.34	4.82	5.82
				Wafer to	Wafer	41045.4	2211.01	5.39	7.90
						Dep Rate:	342.05	A/min