DATE:	12/4/2007		RECIPE:	POLY.002		Operator	Gordon
TUBE #:	T2		FILE:
Process:	LARGE GRAIN POLY
TEMPL:	625	DEP TIME	30	min
TEMPC:	630	GAS	SiH4	GAS		PRCPR	250 mtorr
TEMPS:	635	FLOW	75	FLOW
WAFER:	4" SILICON
SIZE	100mm	Substrate:	100
LOAD	25	Comment:	Refractive index = 3.18, Good run
POSITION	CENTER	TOP	LEFT	BOTTOM	RIGHT	Mean Avg	S1 Dev	+ or - %	HI-LO%
5	4431	4415	4437	4502	4461	4449.2	33.83	0.76	0.98
20	4307	4288	4321	4387	4358	4332.2	39.95	0.92	1.14
				Wafer to	Wafer	4390.7	70.85	1.61	2.44
						Dep Rate:	146.36	A/min