DATE:	10/30/2007		RECIPE:	POLY.002		Operator	Gordon
TUBE #:	T2		FILE:
Process:	LARGE GRAIN POLY
TEMPL:	625	DEP TIME	30	min
TEMPC:	630	GAS	SiH4	GAS		PRCPR	250 mtorr
TEMPS:	635	FLOW	75	FLOW
WAFER:	4" SILICON
SIZE	100mm	Substrate:	100
LOAD	25	Comment:	Refractive index = 3.18, Good run
POSITION	CENTER	TOP	LEFT	BOTTOM	RIGHT	Mean Avg	S1 Dev	+ or - %	HI-LO%
5	4522	4597	4504	4538	4551	4542.4	35.23	0.78	1.02
20	4397	4480	4374	4416	4447	4422.8	41.69	0.94	1.20
				Wafer to	Wafer	4482.6	72.78	1.62	2.49
						Dep Rate:	149.42	A/min