DATE:	8/21/2009		Operator	John Maynard
Process:	Cryo Evap: Aluminum
Target	3000A
TEMPC:	25
WAFER:	4" SILICON
SIZE	100mm	Substrate:	<100>
LOAD	1	Comment:
Run	CENTER	TOP	LEFT	FLAT	RIGHT	Mean Avg	S1 Dev	+ or - %	HI-LO%
1	3035	3038	3060	2964	2991	3017.6	39.04	1.29	1.59
					Sheet R	0.386	+ / - %	0.981	Ohm/sq
					Resistivity	1.16E-05	Ohm-cm
					Bulk Al	2.82E-06	Ohm-cm