DATE:	12/12/2008		Operator	Keith Bradshaw
Process:	Cryo Evap: Aluminum
Target	3000A
TEMPC:	25
WAFER:	4" SILICON
SIZE	100mm	Substrate:	100
LOAD	1	Comment:	Sheet resistance =  121 mOhm/sq +-3.41%
Run	CENTER	TOP	LEFT	FLAT	RIGHT	Mean Avg	S1 Dev	+ or - %	HI-LO%
1	3720	3131	3581	3579	3417	3485.6	225.40	6.47	8.45
					Sheet R	0.121	+ / - %	0.48	Ohm/sq
					Resistivity	4.22E-06	Ohm-cm
					Bulk Al	2.82E-06	Ohm-cm