DATE:	9/15/2009		Operator	John Maynard
Process:	CHA-50 Evap: Aluminum
Target:	3000A
TEMPC:	25
WAFER:	4" SILICON
SIZE	100mm	Substrate:	<100>
LOAD	1	Comment:
Run	CENTER	TOP	LEFT	FLAT	RIGHT	Mean	S1 Dev	+ or - %	HI-LO%
1	2967	2910	2873	2897	2949	2919.2	38.36	1.31	1.61
					Sheet R	0.22	+ / - %	2.97	Ohm/sq
					Resistivity	6.422E-06	Ohm-cm
					Bulk Al	2.82E-06	Ohm-cm