| DATE: | 9/30/2009 | RECIPE: | JBB_10nm_AL2O3 | Operator | Scott | ||||
| Tool: | Cambridge ALD | ||||||||
| Process: | 10 nm Al2O3 | ||||||||
| TEMPL: | 200C | Cycles | 100 | ||||||
| TEMPC: | 200C | GAS | TMA | ||||||
| GAS | H2O | ||||||||
| WAFER: | P-Type 10 Ohm/cm | ||||||||
| SIZE | 100mm | Substrate: | <100> | ||||||
| LOAD | 1 | Comment | Ellipsomet | Tox=108.9, N0 = 1.778, N1 = -117.2 | |||||
| POSITION | CENTER | TOP | LEFT | FLAT | RIGHT | Mean Avg | S1 Dev | + or - % | HI-LO% |
| 1 | 108.9 | 109.4 | 109 | 109.9 | 110.1 | 109.5 | 0.53 | 0.49 | 0.55 |