| DATE: | 12/2/2009 | RECIPE: | Chrome | Operator | Arnold | |||||
| Gun #: | 4 | FILE: | ||||||||
| Process: | Chrome Deposition, RF | |||||||||
| PowerW | 200 | DEP TIME | 60 | min | ||||||
| TEMPC: | 25 | GAS | Ar | |||||||
| Pressure | 4mTorr | FLOW | 12 | |||||||
| WAFER: | 4" SILICON | |||||||||
| SIZE | 100mm | Substrate: | <100> | |||||||
| LOAD | 1 | Comment | ||||||||
| Run | CENTER | TOP | LEFT | FLAT | RIGHT | Mean Avg | S1 Dev | + or - % | HI-LO% | |
| 1 | 4206 | 3228 | 4123 | 4066 | 3973 | 3919.2 | 395.60 | 10.09 | 12.48 | |
| Dep Rate: | 65.32 | A/min | ||||||||
| Sheet R | 1.161 | Ohm/sq | + / - % | 1.34 | ||||||
| Resistivity | 4.55E-05 | Ohm-cm | ||||||||
| Bulk Cr | 1.27E-05 | Ohm-cm | ||||||||