DATE:	8/21/2009		RECIPE:	Chrome		Operator	Arnold
Gun #:	4		FILE:
Process:	Chrome Deposition, RF
PowerW	200	DEP TIME	60	min
TEMPC:	25	GAS	Ar
Pressure	4mTorr	FLOW	12
WAFER:	4" SILICON
SIZE	100mm	Substrate:	<100>
LOAD	1	Comment:
Run	CENTER	TOP	LEFT	FLAT	RIGHT	Mean Avg	S1 Dev	+ or - %	HI-LO%
1	4709	4661	4320	4333	4284	4461.4	205.61	4.61	4.76
						Dep Rate:	74.36	A/min
						Sheet R	2.732	Ohm/sq	+ / - %	1.54
						Resistivity	0.000122	Ohm-cm
						Bulk Cr	1.27E-05	Ohm-cm