DATE:	1/29/2009		RECIPE:	Chrome		Operator	Arnold
Gun #:	4		FILE:
Process:	Chrome Deposition, RF
PowerW	200	DEP TIME	60	min
TEMPC:	25	GAS	Ar
Pressure	4mTorr	FLOW	12
WAFER:	4" SILICON
SIZE	100mm	Substrate:	100
LOAD	1	Comment:	Sheet resistance =  253.5 mOhm/sq +- 0.65%
Run	CENTER	TOP	LEFT	FLAT	RIGHT	Mean Avg	S1 Dev	+ or - %	HI-LO%
1	4661	4280	4101	4320	4209	4314.2	210.95	4.89	6.49
						Dep Rate:	71.90	A/min
						Sheet R	0.253	Ohm/sq	+ / - %	0.65
						Resistivity	1.09E-05	Ohm-cm
						Bulk Cr	1.27E-05	Ohm-cm