DATE:	11/7/2008		RECIPE:	Chrome		Operator	Arnold
Gun #:	4		FILE:
Process:	Chrome Deposition, RF
PowerW	200	DEP TIME	60	min
TEMPC:	25	GAS	Ar
Pressure	4mTorr	FLOW	12
WAFER:	4" SILICON
SIZE	100mm	Substrate:	100
LOAD	1	Comment:	Sheet resistance =  870.5 mOhm/sq +- 0.79%
Run	CENTER	TOP	LEFT	FLAT	RIGHT	Mean Avg	S1 Dev	+ or - %	HI-LO%
1	4041	3604	4053	3892	3921	3902.2	181.24	4.64	5.75
						Dep Rate:	65.04	A/min
						Sheet R	0.8705	Ohm/sq	+ / - %	0.79
						Resistivity	3.4E-05	Ohm-cm
						Bulk Cr	1.27E-05	Ohm-cm